A Random Walk Approach for Light Scattering in MaterialConference paper
Authors: Klaus Simon 1; Beat Trachsler 1
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Klaus Simon;Beat Trachsler
1 Swiss Federal Laboratories for Materials Science and Technology [Thun]
Understanding reflection is one of the key competences in graphic arts industry. A very popular approach was given by Kubelka andMunk [1931] who derived a simple relationship between the scattering and absorption coefficients and the overall reflectance. This paper presents an alternative approach which describes the behavior of light in matter as a special kind of random walk.
Volume: DMTCS Proceedings vol. AC, Discrete Random Walks (DRW'03)
Section: Proceedings
Published on: January 1, 2003
Imported on: May 10, 2017
Keywords: Random Walk,Kubelka-Munk,Light Scattering,First-Passage Time Probability,Narayana Numbers,Catalan Numbers,Chebyshev Polynomials,[INFO.INFO-DS]Computer Science [cs]/Data Structures and Algorithms [cs.DS],[INFO.INFO-DM]Computer Science [cs]/Discrete Mathematics [cs.DM],[MATH.MATH-CO]Mathematics [math]/Combinatorics [math.CO],[INFO.INFO-CG]Computer Science [cs]/Computational Geometry [cs.CG]
Bibliographic References
2 Documents citing this article
V. V. Savchenko;M. A. Savchenko, 2020, Вычислительный эксперимент по моделированию распространения света в волокнистой профилированной структуре, Успехи кибернетики / Russian Journal of Cybernetics, 1(1), pp. 50-57, 10.51790/2712-9942-2020-1-1-7, https://doi.org/10.51790/2712-9942-2020-1-1-7.
Abbas Hajipour;Ali Shams Nateri;Alireza Sadr Momtaz, 2014, Estimation of fabric opacity by scanner, Sensor Review, 34, 4, pp. 404-409, 10.1108/sr-01-2013-607.