A Random Walk Approach for Light Scattering in MaterialArticle
Authors: Klaus Simon 1; Beat Trachsler 1
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Klaus Simon;Beat Trachsler
1 Swiss Federal Laboratories for Materials Science and Technology [Thun]
Understanding reflection is one of the key competences in graphic arts industry. A very popular approach was given by Kubelka andMunk [1931] who derived a simple relationship between the scattering and absorption coefficients and the overall reflectance. This paper presents an alternative approach which describes the behavior of light in matter as a special kind of random walk.